爱普,矽电容,S-Sicap,inteposer,中介层,高电容密度

爱普科技扩大S-SiCapTM技术应用版图 满足AI与HPC新需求

S-SiCapTM产品线涵盖分离式硅电容(Discrete Devices)与硅电容中介层IPC(InterPoser with silicon Capacitor)两大类型,对应不同系统架构与应用情境,满足多元设计需求




全球客制化存储芯片解决方案设计公司爱普科技今日宣布,S-SiCapTM(Stack Silicon Capacitor)产品线持续深化技术布局,聚焦AI服务器与高性能计算(HPC)的整合挑战。S-SiCapTM产品线涵盖分离式硅电容(Discrete Devices)与硅电容中介层IPC(InterPoser with silicon Capacitor)两大类型,对应不同系统架构与应用情境,满足多元设计需求。



爱普科技的分离式硅电容S-SiCapTM Gen4电容值密度已提升至 3.8 μF/mm²,较前一代Gen3再增逾50%。为满足高性能计算与AI服务器对高性能与功率的需求趋势,Gen4亦率先导入嵌入式基板(Embedded Substrate)封装,目前已送样进行制程验证,量产导入时程将自2026年起逐步展开。



另一方面,硅电容中介层S-SiCapTM Interposer采用硅晶圆作为中介层基板,内建高电容密度的硅电容,显著强化裸晶对裸晶(Die-to-Die)、序列器/解序列器(SerDes)及高带宽内存(HBM)等高速I/O应用的信号与电源稳定性。爱普并携手供应链合作,导入接合曝光技术(reticle-stitching technology),扩展中介层裸晶面积,进而承载更多Chiplet IC,满足先进封装对更高整合度的需求。目前S-SiCapTM Interposer已完成客户端的封装与可靠度验证,并于第三季末正式进入四个reticle的量产阶段,新项目亦陆续展开。



爱普科技总经理洪志勋表示,随着AI与高性能计算应用快速成长,市场对电源完整性与高速信号传输的要求日益严苛。爱普透过S-SiCapTM产品线,将硅电容以分离式及中介层方式整合于各类先进封装架构,兼具高效能、高整合度与设计弹性,满足新世代AI与HPC系统的严苛需求。展望未来,爱普也正积极开发能应用在有机中介层(Organic Interposer)的硅电容产品,持续拓展产品版图。



关于爱普科技股份有限公司

爱普科技股份有限公司(TWSE:6531)是无晶圆厂客制化存储芯片设计和IP解决方案的半导体公司。产品包括:IoT存储芯片产品(IoTRAMTM)、AI存储芯片解决方案(VHMTM)、硅电容(S-SiCapTM)。爱普科技拥有强大的研发能力,长期致力为移动通信、穿戴设备、物联网、高端手机应用、高性能计算、边缘计算等领域,提供高性能、低功耗的创新客制化芯片及解决方案,协助全球制造商打造更具竞争力的产品。


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2025-09-09

爱普科技 ApSRAMTM开创高性能低功耗存储芯片新方案

ApSRAMTM为爱普科技虚拟静态随机存取存储芯片(PSRAM)再进阶版本,采用全新架构设计,专为边缘计算与物联网应用打造,提供低功耗、低延迟的高性能存储芯片方案。


搜索
  • IoTRAMTM
  • S-SiCapTM
  • VHMTM
  • 可穿戴式装置
  • 智能家庭
  • S-SiCap 中介層 IP
  • 隐私权政策

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